SELF I-DENTITY through HO`OPONOPONO®
is an ancient Hawaiian problem solving process updated by
Kahuna Lapa`au Morrnah Nalamaku Simeona.
SELF I-DENTITY through HO`OPONOPONO® frees SELF from memories replaying problems through repentance, forgiveness and transmutation.
“If we can accept that we are the sum total of all past thoughts, emotions, words, deeds and actions and that our present lives and choices are colored or shaded by this memory bank of the past, then we begin to see how a process of correcting or setting aright can change our lives, our families and our society.”
Morrnah Nalamaku Simeona
CLASSES FOR REGISTRATION
May 9 & 10, Anchorage, AK, USA ONLINE , SITH® Business Ho’oponopono class
Martha Ugarte , Momilani Ramstrum, Linda Sunrise Dunatov Ed.D.
Start of registration Tuesday, February 11, 2020
End of registration Saturday, May 9, 2020
WORLD WIDE ABSENTEE (WWA) REGISTRATION
IZI LLC is very grateful to be opening the World Wide Absentee Registration. We have the opportunity for more I-Dentities to participate in the cleaning. In meditation with Dr. Hew Len, “Any I-Dentity can sign up to take the Self I-Dentity through Ho’oponopono® class in Absentee.”
For Asia: Any I-Dentity can sign up for Absentee Self I-Dentity through Ho’oponopono® class. The Registrant must be a Review Student.
For Basic II: The WWA Registrant must meet the requirements of a Basic II students to attend a Basic II class as WWA. See Basic II requirements.
Any I-Dentity may be registered for any of IZI LLC sponsors SITH® classes as a World Wide Absentee participant. Family members, children, spouses, boy friends, girlfriends, significant others, friends, businesses, cars, houses, pets, oceans, rivers, lakes, mountains, and all I-Dentities may take the class in absentee. The Registrant (the person who registers and pays for the class) may register any Participant (the I-Dentity). The World Wide Absentee Participant does not have to have taken the class before, to take it in absentee, except for Asia. For Basic II classes, registrant must meet the Basic II requirements to register themselves or another participant.